学術雑誌論文 Analysis of reflection signal from EUV multilayer mirror for irradiation-induced damage study

石野, 雅彦  ,  Ichimaru, Satoshi  ,  Hatayama, Masatoshi  ,  長谷川, 登  ,  Oku, Satoshi  ,  錦野, 将元

内容記述
To utilize intense X-ray pulse sources for scientific researches and industrial applications, it is important to study the damage mechanism caused by X-ray irradiation . The soft X-ray laser (SXRL) pulses can make damages on an extreme ultraviolet (EUV) multilayer mirror . When the SXRL pulse irradiates onto the EUV multilayer mirror, a part of input energy is reflected. The SXRL beam irradiated to a damage part, in this case, the reflected intensity is modified. If the pulse width is longer than process time of damage growth, we can observe the modulated intensity, which has been affected by the damage structure formed by the former part of duration. Then, it will be possible to confirm the start time of damage formation in the multilayer structure by use of X-ray streak camera technique.

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