Departmental Bulletin Paper B-C-N 系トライボコーティングの開発とその特性評価"第1報 反応性イオンプレーティングによる高温でのBN 膜形成"(学内特別研究および国外研修,学内特別研究費報告書)

陳, 本栄  ,  渡部, 修一  ,  Honei, Chin  ,  Shuichi, Watanabe

In this article, the results obtained from a study carried out on BN films is reported. BN films were deposited using a reactive ion plating technique at a substrate temperature of 800 °C. This temperature is relatively high value which has not been reported so far. The results indicate that the stoichiometric BN film can be formed, the substrate bias is dependent on the hardness of the film, and the maximum hardness is exhibited at a lower bias value as compared with the conventional case where the substrate temperature is low.

Number of accesses :  

Other information