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Synthesis and Resist Properties of Hyperbranched PolyacetalsSynthesis and Resist Properties of Hyperbranched PolyacetalsAA11576862 |
"/KUDO, Hiroto/"KUDO, Hiroto ,
"/MATSUBARA, Shuhei/"MATSUBARA, Shuhei ,
"/YAMAMOTO, Hiroki/"YAMAMOTO, Hiroki ,
"/KOZAWA, Takahiro/"KOZAWA, Takahiro
28
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1
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, pp.125
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129 , 2015-06-24 , The Society of Photopolymer Science and Technology
ISSN:09149244
NCID:AA11576862
Description
The synthesized noria-AD offered 40 nm resolution resist pattern with LWR = 9.5 nm in the case of EB exposure tool and a clear 26 nm resolution pattern with LWR = 8.3 nm by means of EUV exposure tool. These results indicate that the present poly(THPE-co-BVOC) would have higher potential to offer higher resolution pattern using EUV lithography system.
Full-Text
http://kuir.jm.kansai-u.ac.jp/dspace/bitstream/10112/11219/1/KU-1100-20150624-00.pdf