Journal Article Synthesis and Resist Properties of Hyperbranched Polyacetals

KUDO, Hiroto  ,  MATSUBARA, Shuhei  ,  YAMAMOTO, Hiroki  ,  KOZAWA, Takahiro

28 ( 1 )  , pp.125 - 129 , 2015-06-24 , The Society of Photopolymer Science and Technology
ISSN:09149244
NCID:AA11576862
Description
The synthesized noria-AD offered 40 nm resolution resist pattern with LWR = 9.5 nm in the case of EB exposure tool and a clear 26 nm resolution pattern with LWR = 8.3 nm by means of EUV exposure tool. These results indicate that the present poly(THPE-co-BVOC) would have higher potential to offer higher resolution pattern using EUV lithography system.
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http://kuir.jm.kansai-u.ac.jp/dspace/bitstream/10112/11219/1/KU-1100-20150624-00.pdf

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