Conference Paper Improvement of Interface Property of HfO2/Al2O3/In0.53Ga0.47As Using Nitrogen Plasma Cleaning and Hydrogen Annealing

祢津, 誠晃  ,  Seikou, Netsu  ,  金澤, 徹  ,  Kanazawa, Toru  ,  宮本, 恭幸  ,  MIYAMOTO, YASUYUKI

2015-07

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