Journal Article Chlorine -based inductively coupled plasma etching of GaAs wafer using tripodal paraffinic triptycene as an etching resist mask

松谷, 晃宏  ,  Matsutani, Akihiro  ,  石割, 文崇  ,  Ishiwari, Fumitaka  ,  庄子, 良晃  ,  Shoji, Yoshiaki  ,  梶谷, 孝  ,  Kajitani, Takashi  ,  上原, 卓也  ,  Uehara, Takuya  ,  中川, 勝  ,  Nakagawa, Masaru  ,  福島, 孝典  ,  Fukushima, Takanori

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