Conference Paper Perpendicular Orientation Control of Si-Containing Block Copolymer Domains for Next Generation Lithography

瀬下, 武広  ,  Seshimo, Takehiro

2016-03
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http://t2r2.star.titech.ac.jp/rrws/file/CTT100701660/ATD100000413/outline_13D07071_瀬下武広.pdf

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