Departmental Bulletin Paper Effect of spiral microwave antenna configuration on the production of nano-crystalline film by chemical sputtering in ECR plasma

Romero, Camille Faith  ,  Yamanaka, Masaru  ,  Wada, Motoi  ,  ロメーロ, カミール フェイス  ,  ヤマナカ, マサル  ,  ワダ, モトイ  ,  山中, 優  ,  和田, 元

56 ( 1 )  , pp.1 - 6 , 2015-04-30 , 同志社大学ハリス理化学研究所 , Transcription:ドウシシャ ダイガク ハリス リカガク ケンキュウジョ , Alternative:Harris Science Research Institute of Doshisha University
Nano-diamond thin film has been successfully prepared by placing a Si substrate in front of a carbon target in pure hydrogen electron cyclotron resonance plasma. A quadrupole mass analyzer coupled to an orifice monitored the molecular species distributions produced at the surface of the carbon target. The measured mass distribution of the gas had clearly indicated that the observed hydrocarbon emission was due to chemical sputtering of hydrocarbon. The position of the microwave antenna as well as the electrical bias affected the molecular species from the carbon target, and these parameters can be utilized as the tuning knobs to control the film deposition condition.

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