学術雑誌論文 表面修飾シリカゲルにおける重金属イオンの分配・放出過程の解析
Analyses of the Distribution and Release Processes of Heavy Metal Ions in Surface-modified Silica Gel Systems

近間, 克己  ,  中島, 淳一  ,  松尾, 美那  ,  中谷, 清治

65 ( 3 )  , pp.151 - 155 , 2016-04 , 日本分析化学会 , The Japan Society for Analytical Chemistry
ISSN:0525-1931
NII書誌ID(NCID):AN00222633
内容記述
Distribution and release processes of heavy-metal ions between spherical surface-modified silica gel microparticles and water were analyzed by microcapillary manipulation and absorption microspectroscopy. Silica gel modified with triamine (QuadraSil-TA, Q-TA) or thiol groups (QuadraSil-MP, Q-MP) was used as a surface-modified silica gel. A single microparticle was injected into an aqueous HAuCl4 or CuSO4 solution containing 0.01 M KCl (pH = 6), and the distribution rate of the metal ion from water into the microparticle was measured. The rate of release of Au(III) or Cu(II) from Q-TA into water (pH = 6) was much smaller than that of the distribution of the metal. The microparticle radius dependence of the absorbance of the metal in the microparticle and distribution of the metal by cross-sectional SEM-EDS analysis at the distribution equilibrium indicate that Au(III) and Cu(II) distribute into the microparticle interior for Q-TA, while Au(III) distributes at the outer layer in the spherical microparticle for Q-MP. The distribution processes were analyzed as the intraparticle diffusion, and the diffusion coefficient (Dp) observed in the present systems was compared with that calculated from the theoretical pore and surface diffusion model. We consider that the rate-determining step of the distribution of Au(III) in the Q-TA (pore diameter = 5.9 nm) system is the intraparticle diffusion of AuCl4−. On the other hand, the distribution of Cu(II) into Q-TA was much slower than the intraparticle diffusion.
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