Journal Article Molecular dynamics simulations of Si etching in Cl- and Br-based plasmas: Cl(+) and Br(+) ion incidence in the presence of Cl and Br neutrals

Nakazaki, Nobuya  ,  Takao, Yoshinori  ,  Eriguchi, Koji  ,  Ono, Kouichi

118 ( 23 ) 2015-12-18 , AIP Publishing
ISSN:0021-8979
NCID:AA00693547
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