Thesis or Dissertation A study of defect generation phenomena in single crystalline silicon substrate during plasma processing and the characterization techniques

Nakakubo, Yoshinori

2015-05-25 , Kyoto University
Description
新制・課程博士
甲第19185号
工博第4062号
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http://repository.kulib.kyoto-u.ac.jp/dspace/bitstream/2433/200448/1/ykogk04062.pdf

http://repository.kulib.kyoto-u.ac.jp/dspace/bitstream/2433/200448/2/dkogk04062.pdf

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