Journal Article Molecular dynamics simulations of Si etching in Cl- and Br-based plasmas : Cl+ and Br+ ion incidence in the presence of Cl and Br neutrals

Nakazaki, Nobuya  ,  Takao, Yoshinori  ,  Eriguchi, Koji  ,  Ono, Kouichi

118 ( 23 )  , pp.233304-1 - 233304-18 , 2015-12-18
ISSN:00218979
NCID:AA0069354
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