Thesis or Dissertation Study on plasma etching of GaN at high temperatures for damageless fabrication of next-generation power devices

劉 , 沢鋮  ,  LIU, Zecheng

2017-03-27
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http://ir.nul.nagoya-u.ac.jp/jspui/bitstream/2237/26580/5/k11890_thesis.pdf

http://ir.nul.nagoya-u.ac.jp/jspui/bitstream/2237/26580/2/k11890_abstract.pdf

http://ir.nul.nagoya-u.ac.jp/jspui/bitstream/2237/26580/1/k11890_review.pdf

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