Thesis or Dissertation Study on plasma etching of GaN at high temperatures for damageless fabrication of next-generation power devices

LIU, Zecheng  ,  劉, 沢鋮

2017-03-27
Full-Text

https://nagoya.repo.nii.ac.jp/?action=repository_action_common_download&item_id=24182&item_no=1&attribute_id=17&file_no=1

https://nagoya.repo.nii.ac.jp/?action=repository_action_common_download&item_id=24182&item_no=1&attribute_id=17&file_no=2

https://nagoya.repo.nii.ac.jp/?action=repository_action_common_download&item_id=24182&item_no=1&attribute_id=17&file_no=3

Number of accesses :  

Other information