Journal Article Absolute density of precursor SiH3 radicals and H atoms in H2-diluted SiH4 gas plasma for deposition of microcrystalline silicon films

Hori, Masaru  ,  Sekine, Makoto  ,  Kondo, Hiroki  ,  Fukushima, Atsushi  ,  Tsutsumi, Takayoshi  ,  Takeda, Keigo  ,  Ishikawa, Kenji  ,  Abe, Yusuke

110 ( 4 )  , p.043902 , 2017-01-23 , AIP Publishing
ISSN:0003-6951
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